Service description
ALD offers precise control of depositions down to the atomic scale. ALD is renowned for its film quality.
The principle of ALD is based on sequential pulsing of special precursor vapors, each of which forms about one atomic layer each pulse. Cambridge NanoTech systems, such as the Savannah, are designed to deposit pinhole free coatings that are perfectly uniform in thickness, even deep inside pores, trenches and cavities. The ability to deposit such high quality films on substrates with ultra-high aspect ratios. If you want to have a thicker film you can repeat the cycle several times.
Options and prices chart
Options |
Unit |
Public Sector |
Other customers |
Deposición de materiales por ALD (atomic layer deposition) |
|
51.88 € |
53.19 € |