Dry Etching: Ion Beam Etching/Miling

Support unit: PLATAFORMA NANOQUIM
Institute: INSTITUTO DE CIENCIA DE MATERIALES DE BARCELONA
Locality: Cerdanyola del Vallès (Barcelona)
Service's web: http://www.icmab.csic.es

Information relating to the units that offer the selected service
Support unit	Support unit Information	Selected service	Other services
PLATAFORMA NANOQUIM ICMAB - Cerdanyola del Vallès
LABORATORIO DE MICROSCOPIA ELECTRONICA CENIM - Madrid

Service description

The Ion Milling/Sputtering/E-Beam from TSST is a system made up of a combination of three techniques in the same equipment. The system is furnished of an Ion Miller which allows to thin samples by Ar ions bombardment. General: load lock chamber with an annealing system at Oxygen pressure. Rotating sample holder system. Ion Miller: gridded 4cm diameter source with a beam voltage from 100 to 1200 V DC, and a beam current of about 100mA.

Options and prices chart
Options	Unit	Public Sector	Other customers
Adelgazamiento Iónico	€ / hora	123.22 €	153.48 €

Service description

Options and prices chart
Options	Unit	Public Sector	Other customers
Dry etching: Ion beam etching/milling	euro / muestra	86.79 €	95.05 €
Dry etching: Ion beam etching/milling - Cleaning	euro / muestra	63.39 €	69.43 €