Standard Laser Processing

Service description

Processing with ns pulsed lasers The service has available 2 excimer lasers with a pulse duration of 20 ns operating at either 193 or 248 nm with pulse energies and repetition rates in the 200-500 mJ/pulse and 1-20 Hz range respectively. Both laser systems have beam homogenization and components for control and focusing on static samples or moving samples. It is possible to process areas of up to 3 cm x 5 cm by superimposing laser pulses. A high-energy Nd-YAG laser (1064 nm, 1500 mJ) is also available, with frequency doubling and tripling options (532 nm, 800 mJ / 355 nm, 450 mJ) at 10 Hz repetition rate for the realization of static irradiation or controlled movement laser irradiation. These systems allow inducing surface structural transformations, cleaning, micro-perforation, elimination of superficial layers, as well as the diffusion of impurities or dopants in semiconductors or dielectrics.