Spectroscopy: Ultraviolet Photoelectron Spectroscopy (UPS)

Service description

The XPS analysis Service is equiped with two instruments with different capabilities and aimed to different applications: 1.- A X-ray spectrometer devoted to the analysis of monolithic and "Thin Films" samples. This equipment consists of four interconected ultra high vacuum chambers: the analysis chamber, two preparation chambers and a load lock chamber. The analysis chamber is equiped with a SPEC PHOIBOS 100 hemispherical electron energy analyser and a DLD detector, and with different excitation sources: an acromatic dual X-ray source (Mgkalpha and Alkalpha), a Kimbal electron gun, an ion gun and an UV light source. With these sources, not only XPS analysis, but also UPS, ISS and REELS analyses can be carried out. Short noble gas ion etching and depth profile analysis can also be carried out. The reparation and load lock chambers are equiped with a resistive heater, several leak gas valves, a plasma source, ion sources, view ports and several Knudsen cells, for surface cleaning, chemical treatment, light irradiation or surface coating of the samples, in situ. Photoelectron Spectrometer for "powder Samples" and Gas Reactivity Cell (SPECS PHOIBOS 100, SPECS HPHT CELL), with the following: Analysis chamber, equipped with a multichannel hemispheric analyser (PHOIBOS 100), three axes manipulator, and dual X-ray source (Mgkalpha and Alkalpha). Reactivity Cell, (High Pressure and High Temperature) for treating the samples under controlled gas and vapour atmospheres, up to 200 bar and 800C (simultaneously). Both static and continous flow of gases are possible for those treatments. Samples in the form of powders or thin films can be treated in this chamber. A fast load chamber, where samples can be outgassed at mild temperatures (150C). Ion sputtering of samples to make a depth profiling is also possible under diferrent ion beams (Ar+, O2+, etc). Different additional accesories, such as Metal evaporators, UV-Vis sources can be incorporated if neccesary.